Horizonta iav hmoov txheej tshuab

Ib qho abrastion tshwm sim ua ntej ntawm tag nrho cov "sur-face".

Kev sib txhuam yog cuam tshuam los ntawm cov xwm txheej ntawm "nto". Qhov saum npoo muaj lub ntsiab lus tseem ceeb heev hauv cov xwm txheej zoo li no. Yog tias peb tuaj yeem ua rau tib qhov chaw ntawm cov khoom nyuaj, peb tuaj yeem txo qhov kev puas tsuaj, ncua lub neej ntawm cov cuab yeej txiav, xuas nrig ntaus / tuag, ib feem. Yog tias peb tuaj yeem ua rau tib qhov chaw ntawm cov khoom siv roj nplua nyeem ntau dua, peb tuaj yeem zam qhov kev sib tsoo, txhim kho lub zog ua haujlwm.

PVD yog cov txheej txheem txheej txheem uas tsim ob peb micron tawv zaj duab xis ntawm cov cuab yeej. Lub hardness ntawm PVD yog siab tshaj tungsten carbide super-hard khoom. Hauv kev sib piv nrog hard-chromium, nitriding ib yam nkaus, PVD zaj duab xis yog qhov nyuaj dua. Qhov tsuas yog ob peb microns zaj duab xis yog txhim kho cov khoom tiv thaiv kev hnav zoo heev.

Vim tias qhov tuab yog ob peb microns, peb tuaj yeem zam qhov teeb meem hloov pauv qhov tshwj tsis yog daim ntawv thov uas xav tau qhov tseeb heev.

Tsis tas li ntawd, lub hardness ntawm kub kub tempering hlau xws li SKH, SKD tsis ploj vim lub txheej kub yog tswj ntawm 450 degree. Peb cov kev pabcuam PVD txheej tuaj yeem raug xaiv ntawm plaub hom zaj duab xis raws li cov lus hauv qab no. Peb tus kws tshaj lij yuav qhia tias zaj duab xis twg haum rau koj daim ntawv thov.

Zaj duab xis txheejCov Khoom Siv Khoom Siv Khoom Siv Khoom Siv Lub Cev Temp Xim

TiNCarbide, Hss General 450 degree Kub

TiCNCarbide, Hss Punch / Tuag 450 degree Brown

TiAINCarbide, Hss General, HOB 450 degree Dub

CrNCarbide, Hss Tuag 450 degree Nyiaj

DLCCarbide, Hss Toolfor Aluminium 200-300 degree Dub

ACXCabide, Hss DryCutting cuab yeej

Kub Kub Tuag

/ Pwm 480 degree SilverBlack Qhov txawv ntawm sputtering thiab evaporation txheej ntawm kab rov tav iav hmoov txheej tshuab

Muaj ntau hom khoom siv txheej txheej, thiab muaj qhov sib txawv ntawm cov khoom sib txawv. Hauv qab no yog qhov txawv ntawm sputtering thiab evaporation txheej.

evaporation cua sov lub hom phiaj ntawm qhov chaw nyob rau hauv daim ntawv ntawm cov dawb radicals los yog ions yog evaporated thiab ua tiav rau ntawm lub substrate nto, thiab cov txheej txheem tsim zaj duab xis (scattering-kob qauv ntawm vagal paj paj qauv txheej txheej loj hlob) ua ib zaj duab xis nyias.

Lub uniformity ntawm evaporation txheej muaj pes tsawg leeg tsis yog ib qho yooj yim los lav, thiab tuaj yeem tswj tau nrog cov ntsiab lus tshwj xeeb, tab sis vim muaj cov ntsiab lus txwv, rau cov txheej txheem tsis yog ib leeg, cov txheej txheem ntawm evaporation txheej tsis zoo. Sputtering tuaj yeem nkag siab yooj yim raws li kev siv cov khoom siv hluav taws xob lossis cov tshuab hluav taws xob siab los foob lub hom phiaj, kom cov dawb radical lossis ion daim ntawv ntawm cov khoom siv saum npoo yog sputtered thiab tso rau ntawm lub substrate nto thaum lub sij hawm ua zaj duab xis txheej txheem, kev paub, thiab thaum kawg. tsim ntawm nyias zaj duab xis. Cov khoom siv rau lub tshuab nqus tsev ntxhua khaub ncaws Sputtering tau muab faib ua ntau hom, qhov twg tus nqi sputtering txawv thiab evaporation yuav dhau los ua qhov tseem ceeb.

Lub compositional uniformity ntawm laser sputtered PLD sputtered txheej yog ib qho yooj yim los tswj, thiab lub thickness uniformity ntawm lub atomic scale yog tsis zoo (vim yog pulsed sputtering), thiab kev tswj ntawm crystallographic orientation (tawm-ntawm-) kev loj hlob kuj yog ntau dua.

Cov saum toj no piav qhia txog qhov sib txawv ntawm sputtering thiab evaporation txheej ntawm cov khoom siv txheej txheej.Different cov cuab yeej muaj qhov sib txawv qhov zoo thiab qhov tsis zoo. Koj tuaj yeem yuav nws raws li koj tus kheej qhov xwm txheej.

Parameter

Daim ntawv thov

Peb lub tuam txhab

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