
PVD Kub Plating Tshuab
Lub magnetron reactive sputtering ntawm insulators zoo li yooj yim, tab sis qhov tseeb ua haujlwm yog qhov nyuaj. Qhov teeb meem tseem ceeb yog tias cov tshuaj tiv thaiv tshwm sim tsis tau tsuas yog nyob rau ntawm qhov chaw, tab sis kuj nyob rau hauv lub anode, qhov chaw ntawm lub tshuab nqus tsev chamber, thiab qhov chaw ntawm lub hom phiaj.
Lub magnetron reactive sputtering ntawm insulators zoo nkaus li yooj yim, tab sis qhov tseeb kev ua haujlwm yog qhov nyuaj.Qhov teeb meem tseem ceeb yog tias cov tshuaj tiv thaiv tshwm sim tsis tau tsuas yog nyob rau ntawm qhov chaw, tab sis kuj nyob rau ntawm lub anode, qhov chaw ntawm lub tshuab nqus tsev chamber thiab nto lub hom phiaj qhov chaw. Li no ua rau hluav taws tua hluav taws, lub hom phiaj qhov chaw thiab workpiece nto arcing thiab lwm yam. Lub hom phiaj ntxaib thev naus laus zis tsim los ntawm Leybold hauv Tebchaws Yelemees daws qhov teeb meem no zoo heev. Lub hauv paus ntsiab lus yog tias ib khub ntawm lub hom phiaj yog cov cathode thiab anode ntawm ib leeg, yog li tshem tawm cov oxidation los yog nitridation ntawm anode nto.

Txias yog tsim nyog rau txhua qhov chaw (magnetron, multi-arc, ions), vim hais tias ib feem loj ntawm lub zog hloov mus rau hauv tshav kub. Yog tias tsis muaj cua txias lossis cua txias tsis txaus, qhov cua sov no yuav ua rau lub hom phiaj kub siab tshaj 1, 000 degrees thiab yaj tag nrho lub hom phiaj. .
Cov khoom siv magnetron feem ntau kim heev, tab sis nws yog ib qho yooj yim los siv nyiaj rau lwm yam khoom siv xws li lub tshuab nqus tsev, MFC, kev ntsuas cov yeeb yaj kiab thickness thiab tsis quav ntsej lub hom phiaj. Tsis muaj teeb meem zoo npaum li cas cov khoom siv magnetron sputtering yog tsis muaj lub hom phiaj zoo, nws zoo li kos tus zaj tsis muaj qhov kov.
Qhov kom zoo dua ntawm kev siv nruab nrab zaus sputtering yog tias nws tuaj yeem du thiab ntom.Qhov hardness ntawm txheej zaj duab xis yog siab. Zaj duab xis thickness tuaj yeem loj hlob linearly. Tsis muaj tshuaj lom. Lub tshuab nqus tsev vacuum multi-arc sputtering siv ib qho hluav taws xob me me thiab qhov loj tam sim no rau lub hom phiaj kom ionize cov khoom (cov khoom muaj txiaj ntsig zoo), yog li ntaus lub substrate (tsis zoo them) ntawm kev kub ceev thiab tso nyiaj, tsim cov zaj duab xis tuab thiab ib zaj duab xis nyuaj. . Feem ntau yog siv rau hnav thiab corrosion resistant films. Qhov tsis zoo yog qhov zoo thiab tsis zoo hluav taws xob cuam tshuam ua rau cov yeeb yaj kiab tsis sib xws, qhov thiab ablation.
Lub hauv paus ntsiab lus ntawm intermediate zaus sputtering yog tib yam li ntawm DC sputtering. Qhov txawv yog tias DC sputtering siv lub tog raj kheej li anode, thaum intermediatefrequency sputtering yog khub. Txawm hais tias lub tog raj kheej koom nrog yuav tsum nyob ntawm tus qauv tsim, thiab tag nrho cov kab ke Hauv cov txheej txheem sputtering, kev npaj ntawm anode thiab cathode muaj feem xyuam, thiab muaj ntau txoj hauv kev los koom rau hauv kev sib piv. Cov txheej txheem sib txawv tuaj yeem tau txais cov txiaj ntsig sib txawv thiab sib txawv ion densities. Lub ntsiab thev naus laus zis ntawm nruab nrab zaus sputtering yog nyob rau hauv kev tsim thiab siv cov khoom siv hluav taws xob. Tam sim no, ob txoj hauv kev tawm sine yoj thiab pulse square yoj yog cov paub tab. Txhua tus muaj nws qhov zoo thiab qhov tsis zoo. Ua ntej, peb yuav tsum xav txog hom zaj duab xis, thiab tshuaj xyuas seb lub hwj chim tso tawm txoj kev tsim nyog rau cov yeeb yaj kiab twg. Koj tuaj yeem siv cov yam ntxwv ntawm cov khoom siv hluav taws xob kom tau txais cov txiaj ntsig xav tau. zaj duab xis nyhuv.

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