Jewelry PVD Txheej Tshuab

Hard Film Deposition yog thev naus laus zis ntawm kev siv cov yeeb yaj kiab nyias ntawm cov khoom siv - nruab nrab ntawm ob peb nanometers txog li 100 micrometers, los yog lub thickness ntawm ob peb atoms - mus rau "substrate" nto yuav tsum tau coated, los yog mus rau ib tug yav tas los deposited txheej rau daim ntawv. txheej. Nyias zaj duab xis Deposition manufacturingprocesses yog nyob rau hauv lub plawv ntawm niaj hnub kev lag luam semiconductor, hnub ci vaj huam sib luag, CDs, disk drives, thiab kho qhov muag khoom industries.

Thin Film Deposition feem ntau muab faib ua ob pawg dav - Chemical Deposition thiab Physical Vapor Deposition Txheej Systems.

Muaj ntau hom tshuab nqus tsev vacuum magnetron sputtering. Txhua tus muaj cov qauv kev ua haujlwm sib txawv thiab cov khoom siv. Tab sis lawv muaj ib qho zoo sib xws: kev sib cuam tshuam ntawm cov hlau nplaum thiab cov khoom siv hluav taws xob ua rau cov electrons mus ncig ntawm lub hom phiaj saum npoo, yog li ua rau qhov tshwm sim ntawm electronshitting argon roj los tsim ions. Cov ions generated ntaus lub hom phiaj nto nyob rau hauv qhov kev txiav txim ntawm ib qho hluav taws xob teb kom sputter tawm lub hom phiaj. Nyob rau hauv txoj kev loj hlob ntawm kaum xyoo tsis ntev los no, cov hlau nplaum ruaj khov tau maj mam siv, thiab cov hlau nplaum coil tsis tshua muaj siv.

Lub hom phiaj yog muab faib ua hom sib npaug thiab tsis sib npaug. Lub hom phiaj sib npaug muaj cov txheej txheem sib xws, thiab lub hom phiaj tsis sib npaug ntawm cov txheej txheem muaj lub zog sib txuas nrog lub substrate. Cov hom phiaj sib npaug feem ntau yog siv rau cov yeeb yaj kiab semiconductor optical, thiab cov hom phiaj tsis sib npaug feem ntau yog siv rau hnav cov yeeb yaj kiab zoo nkauj.

Txawm hais tias qhov sib npaug lossis tsis sib npaug, yog tias cov hlau nplaum nyob ruaj ruaj, nws cov yam ntxwv ntawm qhov sib nqus tau txiav txim siab tias qhov kev siv lub hom phiaj dav dav yog tsawg dua 30 feem pua. Txhawm rau nce kev siv tus nqi ntawm cov khoom siv, ib qho kev sib nqus sib nqus tuaj yeem siv tau. Tab sis rotating lub magnetic teb yuav tsum muaj ib tug rotatingmechanism, thiab nyob rau tib lub sij hawm tus sputtering tus nqi yog txo. Rotating magnetic teb feem ntau yog siv rau cov hom phiaj loj lossis kim. Xws li semiconductor zaj duab xis sputtering. Rau cov khoom siv me me thiab cov khoom siv dav dav, cov khoom siv hlau nplaum zoo li qub feem ntau siv.

Nws yog ib qho yooj yim rau sputter hlau thiab alloys nrog lub hom phiaj magnetron hauv lub tshuab nqus tsev vacuum, thiab ignition thiab sputtering yog yooj yim heev. Qhov no yog vim lub hom phiaj (cathode), plasma, thiab sputtered ib feem / lub tshuab nqus tsev tuaj yeem tsim lub voj. Tab sis yog hais tias sputtering insulators xws li ceramics, Circuit Court tawg. Yog li cov neeg siv cov khoom siv hluav taws xob ntau zaus, thiab ntxiv lub zog capacitor rau lub voj voog. Nyob rau hauv no txoj kev, lub hom phiaj cov khoom ua ib tug capacitor nyob rau hauv lub insulating Circuit Court. Txawm li cas los xij, high-frequency magnetron sputtering fais fab mov yog kim, tus nqi sputtering tsawg heev, thiab cov cuab yeej siv hauv av yog qhov nyuaj heev, yog li nws nyuaj rau siv nws ntawm qhov loj. Txhawm rau daws qhov teeb meem no, magnetron reactive sputtering tau tsim. Ntawd yog, siv lub hom phiaj hlau, ntxiv argon thiab cov roj reactive xws li nitrogen lossis oxygen. Thaum cov hlau targethis ib feem, nws ua ke nrog cov roj reactive tsim nitrides los yog oxides vim lub zog hloov dua siab tshiab.

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